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EE 187 - VLSI and ULSI Technology – Fall 2009 |
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Professor: Dr. Yu-Chong Tai TAs: Ray Huang, Justin Kim and Penvipha Satsanarukkit Office
Hours are held in Office hours: Monday and Tuesdays Course Materials: Lecture Notes. (Optional) Text Book: Silicon Processing for the VLSI Era, Volume 1 - Process Technology, 2nd Edition, S. Wolf and R.N. Tauber, Lattice Press, ISBN 0-9616721-6-1 Description: 9 units (3-0-6); first term. Prerequisites: APh/EE 9 ab, EE/APh 180 or instructor’s permission. This course is designed to cover the state-of-the-art micro/nanotechnologies for the fabrication of ULSI including BJT, CMOS, and BiCMOS. Technologies include lithography, diffusion, ion implantation, oxidation, plasma deposition and etching, etc. Topics also include the use of chemistry, thermal dynamics, mechanics, and physics. Additional
Class Notes: 1. Introduction 4. Diffusion 5. Oxidation 6. Epitaxy Homework: (NO
COLLABORATION)
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